Analysis of Contamination on Semiconductor Ultra-Pure Materials and Wafer Surfaces
PRODUCTS
HR-ICP-MS(High Resolution Inductively coupled Plas)
Product Introduction
Using a double-focusing sector field design, it physically separates multi-atomic ion interferences in high-resolution mode, fundamentally overcoming the spectroscopic interference bottleneck in complex matrices. It's recognized as the 'gold standard' for trace element analysis in complex matrices. It can completely separate interference systems that are hard to remove with quadrupole systems (like ArC⁺ vs. Cr, ClO⁺ vs. V), providing accurate and reliable data for ultra-pure materials and biological matrices.
Application Scenarios
Analysis of Contamination on Semiconductor Ultra-Pure Materials and Wafer Surfaces
Environmental Geochemistry
Clinical Toxicology
High-purity reagent quality control
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